Price list

Full-service prices* for Commercial & Academic users


Valid from 1st July 2019





Lithography

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
RAITHE-beam writer RAITH150 Two3 300
127
1 800
70
MIRAScanning Electron Microscope/E-beam writer TESCAN MIRA32 900
112
1 30050
DWLUV Direct Write Laser system Heidelberg Instruments DWL 66-fs2 420
93
1 30050
SUSS-MA8Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen33 370
130
1 30050
SUSS-WETBENCHLithographic wetbench for resist coating SÜSS MicroTec2 950
113
1 30050
SUSS-RCD8Resist coating and development system SÜSS MicroTec RCD82 760
106
1 30050
LAURELLSpincoater Laurell WS-650-23B2 950
113
90035
NANOCALCSpectroscopic reflectometer Ocean Optics NanoCalc 20002 270
87
90035
DEKTAKMechanical profilometer Bruker Dektak XT2 490
96
1 30050
DIENERResist stripper Diener electronic NANO Plasma cleaner2 300
88
1 30050






Depositions and etching

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
EVAPORATORElectron beam evaporator BESTEC3 650**
140**
1 300**50**
MAGNETRONMagnetron sputtering system BESTEC3 240**
125**
1 300**50**
ALDAtomic layer deposition system Ultratech/CambridgeNanoTech Fiji 2003 080
118
1 30050
XERIONRapid thermal annealing Xerion XREACT/1 250°C2 660
102
90035
XEF2XeF2 etching system2 300
88
1 30050
PARYLENESCS Parylene Deposition System2 300
88
1 30050
PECVD-NANOFABHigh-temperature PECVD of C-based materials Oxford Instruments Plasma Technology NanoFab3 390
130
1 30050
Experimental-PECVDPECVD with ion and mass analyzer, optical emission spectroscopy, in situ ellipsometry, langmuir probe3 780
145
1 30050
APCVDAtmospheric Pressure chemical vapor deposition2 930
113
1 30050
LPCVDLow-pressure chemical vapor deposition2 930
113
1 30050
MOCVDMetal-organic chemical vapor deposition3 280
126
1 30050
PECVDPECVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 1003 780
145
1 30050
DRIEDeep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 1003 330
128
1 30050
SCIAIon beam etching Scia Systems Coat 2003 450
133
1 30050
RIE-CHLORINEReactive ion etching of III-V semiconductors Oxford Instruments Plasma Technology PlasmaPro 1002 780
107
1 30050
RIE-FLUORINERIE of Si-based materials/deposition of thin films Oxford Instruments PlasmaPro NGP 803 610
139
1 30050







Packaging

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
WIRE-BONDERWire bonder TPT HB 162 230
86
90035
LASER-DICERLaser dicer Oxford Lasers A-Series2 600
100
90035
DICING-SAWSemiautomatic dicing saw ESEC 80032 600
100
90035







UHV Technologies

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
SIMSSecondary Ion Mass Spectroscopy ION-TOF TOF.SIMS54 200
162
1 80070
KRATOS-XPSX-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra4 200
162
1 80070
NANOSAMnanoScanning Auger Microscopy Scienta Omicron nanoSAM Lab4 200
162
1 80070
UHV-CLUSTERUltra-High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS2 900
112
1 80070







Microscopy and nanomanipulation

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
LYRAFocused Ion Beam/Scanning Electron Microscope TESCAN LYRA33 600
138
1 30050
MIRA3-XMUScanning electron microscope (SEM) MIRA3 XMU2 900
112
1 30050
ICON-SPMScanning Probe Microscope Bruker Dimension Icon3 120
120
1 30050
RAMANWitec Alpha 300R3 120
120
1 30050
NANOSCANNanoScan VLS-803 120
120
1 30050
KERR-MICROSCOPEMagneto-optical Kerr microscope2 690
103
90035
NANOINDENTORHysitron TI 9503 300
127
1 30050







Optical measurements

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
FTIRVacuum FTIR Vertex80v + microscope Hyperion 3000 KIT3 650
140
1 30050
WOOLLAM-VISNIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE2 700
104
90035
WOOLLAM-MIRMIR spectroscopic ellipsometer J. A. Woollam IR-VASE2 830
109
1 30050
VUVASVacuum ultraviolet spectrometer McPherson VUVAS 10002 510
97
1 30050
NIRQUEST512NIR Optical Spectrometer Ocean Optics NIRQuest 5122 460
95
90035
JAZ3UV-VIS Optical Spectrometer Ocean Optics JAZ 3-channel2 460
95
90035
SNOM-NANONICSScanning Near-field Optical Microscopy Nanonics Imaging MV 40003 370
130
1 30050
TERSScanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar II3 190
123
1 30050







Electrical and magnetic measurements

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
SUMMITSemi-automated 4-probe system Cascade Microtech SUMMIT 120003 120
120
1 30050
MPS1504-probe station Cascade Microtech MPS 1502 310
89
90035
KEITHLEYKeithley 4200-SCS Parameter Analyzer2 310
89
90035
VERSALABCryogenic-free VSM and ETO measurement system – Quantum Design, VersaLab2 460
95
90035
LAKESHORELow-Temperature Electro-Magnetic Properties Measurement System LakeShore CRX-EM-HF3 080
118
1 30050
CRYOGENICLow-Temperature Vibrating Sample Magnetometer Cryogenic Limited3 220
124
1 30050







Electron microscopy

Commercial
CZK/hour
EUR/hour
CZK/hourEUR/hour
TITANHigh resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed6 100
235
2 30088
HELIOSFocused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 6604 200
162
1 80070
VERIOSHigh-resolution Scanning Electron Microscope FEI Verios 460L3 600
138
1 80070







Sample preparation

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
STEMIStereomicroscope Zeiss Stemi 5081 900
73
90035
TENUPOLTEM electrolytic polisher Tenupol 52 260
87
90035
FISCHIONE-160TEM specimen grinding tool Fischione 1601 960
75
90035
FISCHIONE-170Ultrasonic TEM disc cutter Fischione 1702 060
79
90035
CITOVACVacuum impregnation chamber Citovac1 970
76
90035
LEICACOAT-STANCoater Leica EM ACE6002 220
85
90035
TXPTarget surfacing system Leica TXP1 900
73
90035
TIC3XCross-section/broad beam ion polisher Leica EM TIC3X2 670
103
90035
FISCHIONE-200Dimple grinder Fichione 2001 970
76
90035
LECTROPOLElectrolytic polisher Lectropol 52 180
84
90035
TEGRAMINGrinder/polisher Tegramin 302 210
86
90035
ZEISS-Z1MInverted light microscope Zeiss Axio Observer Z1m2 070
80
90035
FISCHIONE-TEM MILLIon polisher Fischione TEM Mill 10502 870
110
90035
LABOTOM5Metallographic saw Labotom 52 270
87
90035
CITOPRESSMounting press Citopress 101 930
74
90035
PLASMACLEANERPlasma cleaner Fischione 10202 360
91
90035
SAW-ACCUTOMPrecision saw Accutom 1002 320
89
90035
LEICACOAT-NANOHigh vacuum coating system for electron microscopy Leica Microsystems EM ACE 6002 220
85
90035







X-ray diffractometry

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
RIGAKU9X-ray diffractometer with high brightness source Rigaku SmartLab 9kW3 260
125
1 30050
RIGAKU3X-ray powder diffractometer Rigaku SmartLab 3kW2 900
112
1 30050







X-ray CT

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
microCTmicroCT GE phoenix v|tome|x L2404 050
156
3 300126
nanoCTnanoCT Rigaku nano3DX
2 900
112
2 41292







LIBS

Commercial
CZK/hour

EUR/hour
Academic
CZK/hour

EUR/hour
LIBSLaser-Induced Breakdown Spectroscopy
2 800
108
2 30088

 
  * Prices without VAT
** Au/Pt – 15 CZK/nm (EVAPORATOR, MAGNETRON)
     Prices in EUR are approximate at the rate of 26 CZK = 1 EUR