
Price list
Full-service prices* for Commercial & Academic users | |||||
---|---|---|---|---|---|
Valid from 1st July 2019 | |||||
Lithography | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
RAITH | E-beam writer RAITH150 Two | 3 300 | 127 | 1 800 | 70 |
MIRA | Scanning Electron Microscope/E-beam writer TESCAN MIRA3 | 2 900 | 112 | 1 300 | 50 |
DWL | UV Direct Write Laser system Heidelberg Instruments DWL 66-fs | 2 420 | 93 | 1 300 | 50 |
SUSS-MA8 | Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 | 3 370 | 130 | 1 300 | 50 |
SUSS-WETBENCH | Lithographic wetbench for resist coating SÜSS MicroTec | 2 950 | 113 | 1 300 | 50 |
SUSS-RCD8 | Resist coating and development system SÜSS MicroTec RCD8 | 2 760 | 106 | 1 300 | 50 |
LAURELL | Spincoater Laurell WS-650-23B | 2 950 | 113 | 900 | 35 |
NANOCALC | Spectroscopic reflectometer Ocean Optics NanoCalc 2000 | 2 270 | 87 | 900 | 35 |
DEKTAK | Mechanical profilometer Bruker Dektak XT | 2 490 | 96 | 1 300 | 50 |
DIENER | Resist stripper Diener electronic NANO Plasma cleaner | 2 300 | 88 | 1 300 | 50 |
Depositions and etching | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
EVAPORATOR | Electron beam evaporator BESTEC | 3 650** | 140** | 1 300** | 50** |
MAGNETRON | Magnetron sputtering system BESTEC | 3 240** | 125** | 1 300** | 50** |
ALD | Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 | 3 080 | 118 | 1 300 | 50 |
XERION | Rapid thermal annealing Xerion XREACT/1 250°C | 2 660 | 102 | 900 | 35 |
XEF2 | XeF2 etching system | 2 300 | 88 | 1 300 | 50 |
PARYLENE | SCS Parylene Deposition System | 2 300 | 88 | 1 300 | 50 |
PECVD-NANOFAB | High-temperature PECVD of C-based materials Oxford Instruments Plasma Technology NanoFab | 3 390 | 130 | 1 300 | 50 |
Experimental-PECVD | PECVD with ion and mass analyzer, optical emission spectroscopy, in situ ellipsometry, langmuir probe | 3 780 | 145 | 1 300 | 50 |
APCVD | Atmospheric Pressure chemical vapor deposition | 2 930 | 113 | 1 300 | 50 |
LPCVD | Low-pressure chemical vapor deposition | 2 930 | 113 | 1 300 | 50 |
MOCVD | Metal-organic chemical vapor deposition | 3 280 | 126 | 1 300 | 50 |
PECVD | PECVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 3 780 | 145 | 1 300 | 50 |
DRIE | Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 3 330 | 128 | 1 300 | 50 |
SCIA | Ion beam etching Scia Systems Coat 200 | 3 450 | 133 | 1 300 | 50 |
RIE-CHLORINE | Reactive ion etching of III-V semiconductors Oxford Instruments Plasma Technology PlasmaPro 100 | 2 780 | 107 | 1 300 | 50 |
RIE-FLUORINE | RIE of Si-based materials/deposition of thin films Oxford Instruments PlasmaPro NGP 80 | 3 610 | 139 | 1 300 | 50 |
Packaging | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
WIRE-BONDER | Wire bonder TPT HB 16 | 2 230 | 86 | 900 | 35 |
LASER-DICER | Laser dicer Oxford Lasers A-Series | 2 600 | 100 | 900 | 35 |
DICING-SAW | Semiautomatic dicing saw ESEC 8003 | 2 600 | 100 | 900 | 35 |
UHV Technologies | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
SIMS | Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5 | 4 200 | 162 | 1 800 | 70 |
KRATOS-XPS | X-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra | 4 200 | 162 | 1 800 | 70 |
NANOSAM | nanoScanning Auger Microscopy Scienta Omicron nanoSAM Lab | 4 200 | 162 | 1 800 | 70 |
UHV-CLUSTER | Ultra-High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS | 2 900 | 112 | 1 800 | 70 |
Microscopy and nanomanipulation | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
LYRA | Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 | 3 600 | 138 | 1 300 | 50 |
MIRA3-XMU | Scanning electron microscope (SEM) MIRA3 XMU | 2 900 | 112 | 1 300 | 50 |
ICON-SPM | Scanning Probe Microscope Bruker Dimension Icon | 3 120 | 120 | 1 300 | 50 |
RAMAN | Witec Alpha 300R | 3 120 | 120 | 1 300 | 50 |
NANOSCAN | NanoScan VLS-80 | 3 120 | 120 | 1 300 | 50 |
KERR-MICROSCOPE | Magneto-optical Kerr microscope | 2 690 | 103 | 900 | 35 |
NANOINDENTOR | Hysitron TI 950 | 3 300 | 127 | 1 300 | 50 |
Optical measurements | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
FTIR | Vacuum FTIR Vertex80v + microscope Hyperion 3000 KIT | 3 650 | 140 | 1 300 | 50 |
WOOLLAM-VIS | NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE | 2 700 | 104 | 900 | 35 |
WOOLLAM-MIR | MIR spectroscopic ellipsometer J. A. Woollam IR-VASE | 2 830 | 109 | 1 300 | 50 |
VUVAS | Vacuum ultraviolet spectrometer McPherson VUVAS 1000 | 2 510 | 97 | 1 300 | 50 |
NIRQUEST512 | NIR Optical Spectrometer Ocean Optics NIRQuest 512 | 2 460 | 95 | 900 | 35 |
JAZ3 | UV-VIS Optical Spectrometer Ocean Optics JAZ 3-channel | 2 460 | 95 | 900 | 35 |
SNOM-NANONICS | Scanning Near-field Optical Microscopy Nanonics Imaging MV 4000 | 3 370 | 130 | 1 300 | 50 |
TERS | Scanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar II | 3 190 | 123 | 1 300 | 50 |
Electrical and magnetic measurements | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
SUMMIT | Semi-automated 4-probe system Cascade Microtech SUMMIT 12000 | 3 120 | 120 | 1 300 | 50 |
MPS150 | 4-probe station Cascade Microtech MPS 150 | 2 310 | 89 | 900 | 35 |
KEITHLEY | Keithley 4200-SCS Parameter Analyzer | 2 310 | 89 | 900 | 35 |
VERSALAB | Cryogenic-free VSM and ETO measurement system – Quantum Design, VersaLab | 2 460 | 95 | 900 | 35 |
LAKESHORE | Low-Temperature Electro-Magnetic Properties Measurement System LakeShore CRX-EM-HF | 3 080 | 118 | 1 300 | 50 |
CRYOGENIC | Low-Temperature Vibrating Sample Magnetometer Cryogenic Limited | 3 220 | 124 | 1 300 | 50 |
Electron microscopy | Commercial CZK/hour | EUR/hour | CZK/hour | EUR/hour | |
TITAN | High resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed | 6 100 | 235 | 2 300 | 88 |
HELIOS | Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 | 4 200 | 162 | 1 800 | 70 |
VERIOS | High-resolution Scanning Electron Microscope FEI Verios 460L | 3 600 | 138 | 1 800 | 70 |
Sample preparation | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
STEMI | Stereomicroscope Zeiss Stemi 508 | 1 900 | 73 | 900 | 35 |
TENUPOL | TEM electrolytic polisher Tenupol 5 | 2 260 | 87 | 900 | 35 |
FISCHIONE-160 | TEM specimen grinding tool Fischione 160 | 1 960 | 75 | 900 | 35 |
FISCHIONE-170 | Ultrasonic TEM disc cutter Fischione 170 | 2 060 | 79 | 900 | 35 |
CITOVAC | Vacuum impregnation chamber Citovac | 1 970 | 76 | 900 | 35 |
LEICACOAT-STAN | Coater Leica EM ACE600 | 2 220 | 85 | 900 | 35 |
TXP | Target surfacing system Leica TXP | 1 900 | 73 | 900 | 35 |
TIC3X | Cross-section/broad beam ion polisher Leica EM TIC3X | 2 670 | 103 | 900 | 35 |
FISCHIONE-200 | Dimple grinder Fichione 200 | 1 970 | 76 | 900 | 35 |
LECTROPOL | Electrolytic polisher Lectropol 5 | 2 180 | 84 | 900 | 35 |
TEGRAMIN | Grinder/polisher Tegramin 30 | 2 210 | 86 | 900 | 35 |
ZEISS-Z1M | Inverted light microscope Zeiss Axio Observer Z1m | 2 070 | 80 | 900 | 35 |
FISCHIONE-TEM MILL | Ion polisher Fischione TEM Mill 1050 | 2 870 | 110 | 900 | 35 |
LABOTOM5 | Metallographic saw Labotom 5 | 2 270 | 87 | 900 | 35 |
CITOPRESS | Mounting press Citopress 10 | 1 930 | 74 | 900 | 35 |
PLASMACLEANER | Plasma cleaner Fischione 1020 | 2 360 | 91 | 900 | 35 |
SAW-ACCUTOM | Precision saw Accutom 100 | 2 320 | 89 | 900 | 35 |
LEICACOAT-NANO | High vacuum coating system for electron microscopy Leica Microsystems EM ACE 600 | 2 220 | 85 | 900 | 35 |
X-ray diffractometry | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
RIGAKU9 | X-ray diffractometer with high brightness source Rigaku SmartLab 9kW | 3 260 | 125 | 1 300 | 50 |
RIGAKU3 | X-ray powder diffractometer Rigaku SmartLab 3kW | 2 900 | 112 | 1 300 | 50 |
X-ray CT | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
microCT | microCT GE phoenix v|tome|x L240 | 4 050 | 156 | 3 300 | 126 |
nanoCT | nanoCT Rigaku nano3DX | 2 900 | 112 | 2 412 | 92 |
LIBS | Commercial CZK/hour | EUR/hour | Academic CZK/hour | EUR/hour | |
LIBS | Laser-Induced Breakdown Spectroscopy | 2 800 | 108 | 2 300 | 88 |
* Prices without VAT
** Au/Pt – 15 CZK/nm (EVAPORATOR, MAGNETRON)
Prices in EUR are approximate at the rate of 26 CZK = 1 EUR