Aixtron Aix P6

Methods

CVD microwave deposition system with a focused resonator designed for the deposition of diamond layers and various allotropic forms of carbon (CNT, DLC, etc.) in the pressure range from 15 to 250 mbar, substrate temperature from 400 to 1200 ° C. Formation of optically active layers in a diamond. Possibility of dc preload of the washer, maximum diameter of the washer 7 cm, height 1 cm.