Roth&Rau AK400

Methods

CVD microwave deposition system with linear antennas designed for deposition of diamond layers and various allotropic forms of carbon (CNT, DLC, etc.) in the pressure range from 0.01 to 5 mbar, substrate temperature from 250 to 700 ° C. Possibility of rf preload washers. Wide range of working gases. Pad size max. 20 x 30 cm, height up to 4 (5) cm.