LAURELL-SPIN COATER
The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).
Publications
FABBRI, L.; MIGLIACCIO, L.; ŠIRVINSKYTE, A.; RIZZI, G.; BONDI, L.; TAMAROZZI, C.; WEBER, S.; FRABONI, B.; GLOWACKI, E.; CRAMER, T., 2025: How to Achieve High Spatial Resolution in Organic Optobioelectronic Devices?. ADVANCED MATERIALS INTERFACES 12 (9), p. 1 - 9, doi: 10.1002/admi.202400822 (DIENER, LAURELL-NANO)
Specification
Methods
manual spin coatingDetails
Type of access
Full-service (paid),
Self-service
Research area
Devices
Category
Lithography
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.30