LAURELL-SPIN COATER
The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).
Specification
Methods
manual spin coating| Sample size: | 5x5 mm^2 to 150 mm / 6 inch (125x125 mm^2) |
|---|---|
| Maximum rotation speed: | 12,000 RPM |
| Acceleration: | from 1 RPM increment |
| Instruments: |
Reusable process chamber liner, made from Teflon Wafer Alignment Tool Chucks and Adapters for samples with different size |
Details
Type of access
Full-service (paid),
Self-service
Research area
Devices
Category
Lithography
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.30