LAURELL-SPIN COATER

The Laurell WS-650-23 B spin coater is compact and packed with advanced features. This 650-series coater system will accommodate up to ø150mm wafers and 5" × 5" (127mm × 127mm) substrates, and features a maximum rotational speed of 12,000 RPM (based on a ø100mm silicon wafer).

Specification

Methods

manual spin coating
Sample size: 5x5 mm^2 to 150 mm / 6 inch (125x125 mm^2)
Maximum rotation speed: 12,000 RPM
Acceleration: from 1 RPM increment
Instruments:

Reusable process chamber liner, made from Teflon

Wafer Alignment Tool

Chucks and Adapters for samples with different size

Gallery

Details

Type of access
Full-service (paid), Self-service
Research area
Devices
Category
Lithography
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.30