ML3 Baby MicroWriter

Specification

• 149mm x 149mm maximum writing area.
• 155mm x 155mm x 7mm maximum wafer size.
• 1μm minimum feature size across full writing area.
• 365nm long-life semiconductor lightsource suitable for broadband, g- and h-line positive and negative photoresists (e.g. S1800, ECI-3000, MiR 701).
• XY interferometer with 15nm resolution for precise motion control.
• Fast writing speed: up to 50mm2/minute (1μm minimum feature size), allowing a typical 50mm x 50mm area to be exposed in under 1 hour.
• Autofocus system using yellow light with real-time surface tracking laser– no minimum wafer size.
• High-quality optical microscope with Olympus infinite conjugate x10 plan objective lens and yellow light illumination for alignment to lithographic markers on the wafer (±2μm 3σ alignment accuracy).
  Additional x4 digital zoom can be selected in the software.
• Grey scale exposure mode for 3-dimensional patterning (255 grey levels).
• Software API for external interfacing and control.
• 200nm minimum addressable grid; 15nm sample stage resolution.
• Acceptable file formats: CIF, GDS2, BMP, TIFF, JPEG, PNG, GIF