High vacuum coating system for electron microscopy Leica Microsystems EM ACE 600

High vacuum coater for deposition of conductive coatings on SEM and TEM samples. Processes are driven by bulit-in microprocessor control unit and are fully automatized. Process steps and parameters are set through a touch screen. Equipped with Au sputter target as s standard. Other available targets for the sputtering are: Cr, W, Co, Ti, Al, Pt/Pd.

Specification

Process vacuum 5x10−5 mbar @ 15 min
Ultimate vacuum 2x10−6 mbar @ 24 hour
Working distance min. 30 mm, max. 100 mm (z movement motorized)
Specimen table diameter 104 mm
Stage tilt +/- 60° (motorized)
Coating time 1–1800 s (without respect to sample damage)
Coating thickness 1–1000 nm
Coating thickness detection oscillating quartz crystal, readout resolution: one decimal (0.1 nm accuracy)
Process gas for sputtering Argon 99,99 % or better
Venting gas Nitrogen 99,99 %

Publications

REMEŠOVÁ, M.; TKACHENKO, S.; KVARDA, D.; ROČŇÁKOVÁ, I.; GOLLAS, B.; MENELAOU, M.; ČELKO, L.; KAISER, J., 2020: Effects of anodizing conditions and the addition of Al2O3/PTFE particles on the microstructure and the mechanical properties of porous anodic coatings on the AA1050 aluminium alloy. APPLIED SURFACE SCIENCE, p. 1 - 10, doi: 10.1016/j.apsusc.2020.145780 (LYRA, LEICACOAT-NANO)

Details

Type of access
Full-service (paid), Self-service
Research area
Synthesis
Category
PVD
Subcategory
Sputtering
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.20