UHV Preparation and Analytical System - Low Energy Ion Spectroscopy ION-TOF Qtac 100
The low-energy ion scattering spectroscope (LEIS) system is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The LEIS instrument provides the possibility of analysis of the elemental composition of a top-most surface layer via energy spectroscopy of back-scattered noble gas ions. Equipment: He, Ne, Ar ion sources, full azimuth acceptance analyzer for enhanced sensitivity, atomic oxygen source for sample cleaning, independent load-lock chamber.
Specification
- Analysis of the elemental composition of a top-most surface layer via energy spectroscopy of back-scattered noble gas ions.
- Equipment: He, Ne, Ar ion sources, full azimuth acceptance analyzer for enhanced sensitivity, atomic oxygen source for sample cleaning, independent load-lock chamber.
Publications
REDONDO, J.; LAZAR, P.; PROCHÁZKA, P.; PRŮŠA, S.; MALLADA, B.; CAHLÍK, A.; LACHNITT, J.; BERGER, J.; ŠMÍD, B.; KORMOŠ, L.; JELÍNEK, A.; ČECHAL, J.; ŠVEC, M., 2019: Identification of Two-Dimensional FeO2 Termination of Bulk Hematite α-Fe2O3(0001) Surface. JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 123 (23), p. 14312 - 7, doi: 10.1021/acs.jpcc.9b00244 (UHV-LEEM, UHV-LEIS)
Bábík, P., 2018: Charge exchange processes involved in projectile-target interaction at low energy range studied by HS-LEIS. MASTER'S THESIS, p. 1 - 55 (UHV-LEIS)
Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER'S THESIS, p. 1 - 96 (UHV-XPS, UHV-SPM, ICON-SPM, LYRA, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3)