Ultra High Vacuum Preparation and Analytical System - Low Energy Electron Microscope SPECS FE-LEEM P90
The SPECS LEEM instrument FE-LEEM P90 is a next generation Low Energy Electron Microscope with 4nm resolution for dynamic LEEM microscopy experiments. With this instrument, based on the design of Dr. Rudolf Tromp, nanometer scale processes on surfaces can be observed in real-time. In order to achieve this incoming and outgoing electrons are separated by a 90° magnetic prism array. The magnetic prism transfers both the LEEM image and the LEED pattern astigmatically, allowing routine switching between real image and diffraction. Both image and LEED pattern are transferred without the negative effects of chromatic dispersion, offering superior image and diffraction capabilities. An energy filter enables imaging with an energy resolution down to 250meV with a minimal impact on the high spatial resolution of the instrument. The FE-LEEM P90 is integrated into a UHV LEEM sample analysis chamber with facilities for sample preparation and in-situ high temperature sample processing. The instrument is a part of complex cluster of UHV analytical and preparation subsystems. All subsystems are UHV-connected via a transfer line allowing the user to move a sample from one instrument to another in the UHV environment.
Publications
PROCHÁZKA, P.; STARÁ, V.; PLANER, J.; SKÁLA, T.; ČECHAL, J., 2025: Structure of epitaxial heteromolecular bilayers probed by low-energy electron microscopy. SURFACES AND INTERFACES 62, p. 106251-1 - 8, doi: 10.1016/j.surfin.2025.106251 (UHV-LEEM, UHV-XPS, UHV-SPM)
Prochazka, P.; Frezza, F.; Sánchez-Grande, A.; Carrera, M.; Chen, QF.; Stará, V.; Kurowská, A.; Curiel, D.; Jelínek, P.; Cechal, J., 2025: Monitoring On-Surface Chemical Reactions by Low-Energy Electron Microscopy: from Conformation Change to Ring Closure in 2D Molecular Gas. CHEMISTRY - A EUROPEAN JOURNAL 31 (20), p. 1 - 6, doi: 10.1002/chem.202500561 (UHV-LEEM, UHV-SPM)
KRAJŇÁK, T.; STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2024: Robust Dipolar Layers between Organic Semiconductors and Silver for Energy-Level Alignment. ACS APPLIED MATERIALS & INTERFACES 16 (14), p. 18099 - 13, doi: 10.1021/acsami.3c18697 (UHV-LEEM, UHV-XPS, UHV-SPM)
PROCHÁZKA, P.; ČECHAL, J., 2024: ProLEED Studio: software for modeling low-energy electron diffraction patterns. JOURNAL OF APPLIED CRYSTALLOGRAPHY 57 (1), p. 187 - 7, doi: 10.1107/S1600576723010312 (UHV-LEEM)
JAKUB, Z.; TRLLOVÁ SHAHSAVAR, A.; PLANER, J.; HRŮZA, D.; HERICH, O.; PROCHÁZKA, P.; ČECHAL, J., 2024: How the Support Defines Properties of 2D Metal-Organic Frameworks: Fe-TCNQ on Graphene versus Au(111). JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 146 (5), p. 3471 - 12, doi: 10.1021/jacs.3c13212 (UHV-MBE1, UHV-LEEM, UHV-XPS, UHV-SPM)
Kurowská, A., 2023: 2D metal-organic frameworks from organic carbonitrile molecules on weakly interacting substrates. MASTER'S THESIS, p. 1 - 61 (UHV-MBE1, UHV-LEEM, UHV-SPM, UHV-XPS)
David, J., 2023: Preparation of elementary 2D materials and heterostructures. MASTER'S THESIS, p. 1 - 69 (UHV-LEEM, UHV-XPS, UHV-SPM)
Jeřábek, F., 2023: Microscopic and spectroscopic analysis of elementary 2D materials. BACHELOR'S THESIS, p. 1 - 42 (UHV-LEEM, UHV-SPM)
Makoveev, A. O., 2023: Molecular self-assembly on surfaces: the role of coverage, surface orientation and kinetics. PH.D. THESIS, p. 1 - 169 (UHV-MBE1, UHV-LEEM, UHV-XPS, UHV-SPM)
PROCHÁZKA, P.; ČECHAL, J., 2023: Visualization of molecular stacking using low-energy electron microscopy. ULTRAMICROSCOPY 253, doi: 10.1016/j.ultramic.2023.113799 (UHV-LEEM, UHV-SPM)
MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: Role of Phase Stabilization and Surface Orientation in 4,4 '-Biphenyl-Dicarboxylic Acid Self-Assembly and Transformation on Silver Substrates. JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126 (23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538 (UHV-MBE1, UHV-LEEM, UHV-SPM, UHV-XPS)
JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn). NANOSCALE 14 (26), p. 9507 - 9, doi: 10.1039/d2nr02017c (UHV-LEEM, UHV-XPS, UHV-SPM)
MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: Kinetic control of self-assembly using a low-energy electron beam. APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106 (UHV-LEEM, UHV-XPS, UHV-SPM)
STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver. PHYSICAL REVIEW APPLIED 18 (4), doi: 10.1103/PhysRevApplied.18.044048 (UHV-LEEM, UHV-SPM, UHV-XPS)
PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: Phase transformations in a complete monolayer of 4,4 '-biphenyl-dicarboxylic acid on Ag(001). APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115 (UHV-SPM, UHV-XPS, UHV-LEEM)
NAZZARI, D., GENZER, J., RITTER, V., BETHGE, O., BERTAGNOLLI, E., RAMER, G., LENDL, B., WATANABE, K., TANIGUCHI, T., RURALI, R., KOLÍBAL, M., LUGSTEIN, A., 2021: Highly Biaxially Strained Silicene on Au(111). JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 125 (18), p. 9973 - 8, doi: 10.1021/acs.jpcc.0c11033 (UHV-LEEM)
Kormoš, L., 2021: 2D molecular systems at surfaces. PH.D. THESIS, p. 1 - 140 (UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923 (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-XPS, SIMS)
Tesař, J., 2020: Fabrication and characterization of atomically thin layers. MASTER'S THESIS, p. 1 - 67 (WITEC-RAMAN, MPS150, UHV-LEEM, EVAPORATOR, RAITH, ICON-SPM, WIRE-BONDER)
FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films. NEW JOURNAL OF PHYSICS 22 (7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59 (UHV-LEEM, UHV-XPS, UHV-LEIS)
PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4 '-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14 (6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491 (UHV-LEEM, UHV-SPM, UHV-XPS)
KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11 (1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6 (UHV-LEEM, UHV-SPM, UHV-XPS)
REDONDO, J.; LAZAR, P.; PROCHÁZKA, P.; PRŮŠA, S.; MALLADA, B.; CAHLÍK, A.; LACHNITT, J.; BERGER, J.; ŠMÍD, B.; KORMOŠ, L.; JELÍNEK, A.; ČECHAL, J.; ŠVEC, M., 2019: Identification of Two-Dimensional FeO2 Termination of Bulk Hematite α-Fe2O3(0001) Surface. JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 123 (23), p. 14312 - 7, doi: 10.1021/acs.jpcc.9b00244 (UHV-LEEM, UHV-LEIS)
Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM, p. 1 - 32 (UHV-LEEM, UHV-XPS, UHV-SPM)
KORMOŠ, L.; PROCHÁZKA, P.; ŠIKOLA, T.; ČECHAL, J., 2018: Molecular Passivation of Substrate Step Edges as Origin of Unusual Growth Behavior of 4,4'-Biphenyl Dicarboxylic Acid on Cu(001). JOURNAL OF PHYSICAL CHEMISTRY C (PRINT) 122 (5), p. 2815 - 6, doi: 10.1021/acs.jpcc.7b11436 (UHV-SPM, UHV-LEEM)
REDONDO, J.; TELYCHKO, M.; PROCHÁZKA, P.; KONEČNÝ, M.; BERGER, J.; VONDRÁČEK, M.; ČECHAL, J.; JELÍNEK, P.; ŠVEC, M., 2018: Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001). JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 36 (3), p. 031401-1 - 6, doi: 10.1116/1.5008977 (ICON-SPM, UHV-LEEM)