UHV Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150
The instrument is equipped with the Al Kα and Mg Kα X-ray sources which provide photons with 1486.6eV and 1254.6eV energy respectively and He I/II UV source providing photons with energies of 21.22eV and 40.81eV respectively. The photoelectrons are analyzed in a hemispherical detector in which lens voltages direct the electron onto a two-dimensional (energy, momentum) multi-channel plate allowing for angular-resolved photoelectron spectroscopy (ARPES) experiments. For sample handling there is a 4-axis manipulator (X, Y, Z, Polar rotation). The manipulator allows controlled sample (electron beam) heating up to 800°C (peak short flashes up to 1200°C) as well as liquid nitrogen cooling. The system allows for neutralization of non-conductive samples by means of an electron flood gun. The standard sample holder is compatible with samples of 10mm diameter. There is no general restriction for the sample material (except for Zn) however, compatibility of volatile and/or organic materials should be discussed and agreed in advance.
Publications
Makoveev, A. O., 2023: Molecular self-assembly on surfaces: the role of coverage, surface orientation and kinetics. PH.D. THESIS, p. 1 - 169 (UHV-MBE1, UHV-LEEM, UHV-XPS, UHV-SPM)
David, J., 2023: Preparation of elementary 2D materials and heterostructures. MASTER'S THESIS, p. 1 - 69 (UHV-LEEM, UHV-XPS, UHV-SPM)
KACHTÍK, L.; CITTERBERG, D.; BUKVIŠOVÁ, K.; KEJÍK, L.; LIGMAJER, F.; KOVAŘÍK, M.; MUSÁLEK, T.; KRISHNAPPA, M.; ŠIKOLA, T.; KOLÍBAL, M., 2023: Chiral Nanoparticle Chains on Inorganic Nanotube Templates. NANO LETTERS 23 (13), p. 6010 - 8, doi: 10.1021/acs.nanolett.3c01213 (KRATOS-XPS, UHV-XPS)
AVVAL, T.; PRŮŠA, S.; ČECHAL, J.; CUSHMAN, C. V.; HODGES, G. T.; FEARN, S.; KIM, S. H.;ČECHAL, J.; VANÍČKOVÁ, E.; BÁBÍK, P.; ŠIKOLA, T.; BRONGERSMA, H. H.; LINFORD, M. R., 2023: A tag-and-count approach for quantifying surface silanol densities on fused silica based on atomic layer deposition and high-sensitivity low-energy ion scattering. APPLIED SURFACE SCIENCE 607, p. 154551 - 9, doi: 10.1016/j.apsusc.2022.154551 (UHV-LEIS, UHV-XPS)
STARÁ, V.; PROCHÁZKA, P.; PLANER, J.; SHAHSAVAR, A.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2022: Tunable Energy-Level Alignment in Multilayers of Carboxylic Acids on Silver. PHYSICAL REVIEW APPLIED 18 (4), doi: 10.1103/PhysRevApplied.18.044048 (UHV-LEEM, UHV-SPM, UHV-XPS)
MAKOVEEV, A.; PROCHÁZKA, P.; SHAHSAVAR, A.; KORMOŠ, L.; KRAJŇÁK, T.; STARÁ, V.; ČECHAL, J., 2022: Kinetic control of self-assembly using a low-energy electron beam. APPLIED SURFACE SCIENCE 600, p. 154106 - 7, doi: 10.1016/j.apsusc.2022.154106 (UHV-LEEM, UHV-XPS, UHV-SPM)
JAKUB, Z.; KUROWSKÁ, A.; HERICH, O.; ČERNÁ, L.; KORMOŠ, L.; SHAHSAVAR, A.; PROCHÁZKA, P.; ČECHAL, J., 2022: Remarkably stable metal-organic frameworks on an inert substrate: M-TCNQ on graphene (M = Ni, Fe, Mn). NANOSCALE 14 (26), p. 9507 - 9, doi: 10.1039/d2nr02017c (UHV-LEEM, UHV-XPS, UHV-SPM)
MAKOVEEV, A.; PROCHÁZKA, P.; BLATNIK, M.; KORMOŠ, L.; SKÁLA, T.; ČECHAL, J., 2022: Role of Phase Stabilization and Surface Orientation in 4,4 '-Biphenyl-Dicarboxylic Acid Self-Assembly and Transformation on Silver Substrates. JOURNAL OF PHYSICAL CHEMISTRY C (WEB) 126 (23), p. 9989 - 9, doi: 10.1021/acs.jpcc.2c02538 (UHV-MBE1, UHV-LEEM, UHV-SPM, UHV-XPS)
Kormoš, L., 2021: 2D molecular systems at surfaces. PH.D. THESIS, p. 1 - 140 (UHV-XPS, UHV-LEEM, UHV-SPM, EVAPORATOR)
Zadorozhnii, O., 2021: Exchange bias in metamagnetic heterostructures. MASTER'S THESIS, p. 1 - 81 (MAGNETRON, VERSALAB, KERR-MICROSCOPE, RAITH, RIE-FLUORINE, LYRA, UHV-XPS)
PROCHÁZKA, P.; KORMOŠ, L.; SHAHSAVAR, A.; STARÁ, V.; MAKOVEEV, A.; SKÁLA, T.; BLATNIK, M.; ČECHAL, J., 2021: Phase transformations in a complete monolayer of 4,4 '-biphenyl-dicarboxylic acid on Ag(001). APPLIED SURFACE SCIENCE 547, p. 149115- - 7, doi: 10.1016/j.apsusc.2021.149115 (UHV-SPM, UHV-XPS, UHV-LEEM)
FIKÁČEK, J.; PROCHÁZKA, P.; STETSOVYCH, V.; PRŮŠA, S.; VONDRÁČEK, M.; KORMOŠ, L.; SKÁLA, T.; VLAIC, P.; CAHA, O.; CARVA, K.; ČECHAL, J.; SPRINGHOLZ, G.; HONOLKA, J., 2020: Step-edge assisted large scale FeSe monolayer growth on epitaxial Bi(2)Se(3)thin films. NEW JOURNAL OF PHYSICS 22 (7), p. 1 - 12, doi: 10.1088/1367-2630/ab9b59 (UHV-LEEM, UHV-XPS, UHV-LEIS)
PROCHÁZKA, P.; GOSALVEZ, M.; KORMOŠ, L.; DE LA TORRE, B.; GALLARDO, A.; ALBERDI-RODRIGUEZ, J.; CHUTORA, T.; MAKOVEEV, A.; SHAHSAVAR, A.; ARNAU, A.; JELÍNEK, P.; ČECHAL, J., 2020: Multiscale Analysis of Phase Transformations in Self-Assembled Layers of 4,4 '-Biphenyl Dicarboxylic Acid on the Ag(001) Surface. ACS NANO 14 (6), p. 7269 - 11, doi: 10.1021/acsnano.0c02491 (UHV-LEEM, UHV-SPM, UHV-XPS)
UHLÍŘ, V.; PRESSACCO, F.; ARREGI URIBEETXEBARRIA, J.; PROCHÁZKA, P.; PRŮŠA, S.; POTOČEK, M.; ŠIKOLA, T.; ČECHAL, J.; BENDOUNAN, A.; SIROTTI, F., 2020: Single-layer graphene on epitaxial FeRh thin films. APPLIED SURFACE SCIENCE 514, p. 145923-1 - 7, doi: 10.1016/j.apsusc.2020.145923 (MAGNETRON, VERSALAB, RIGAKU9, UHV-LEEM, UHV-LEIS, UHV-SPM, UHV-XPS, SIMS)
KORMOŠ, L.; PROCHÁZKA, P.; MAKOVEEV, A.; ČECHAL, J., 2020: Complex k-uniform tilings by a simple bitopic precursor self-assembled on Ag(001) surface. NATURE COMMUNICATIONS 11 (1), p. 1 - 6, doi: 10.1038/s41467-020-15727-6 (UHV-LEEM, UHV-SPM, UHV-XPS)
GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263 (ICON-SPM, KERR-MICROSCOPE, LYRA, UHV-XPS)
Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM, p. 1 - 32 (UHV-LEEM, UHV-XPS, UHV-SPM)
Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER'S THESIS, p. 1 - 96 (UHV-XPS, UHV-SPM, ICON-SPM, LYRA, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3)