UHV Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150

The chamber for photoelectron spectroscopy analysis (UHV-XPS) is one of the instruments of the UHV-Cluster, which combines preparation and in-situ analysis by several complementary methods for the characterization of surfaces and thin films. The instrument is equipped with the Al Kα and Mg Kα X-ray sources which provide photons with 1486.6eV and 1254.6eV energy respectively and He I/II UV source providing photons with energies of 21.22eV and 40.81eV respectively. The photoelectrons are analyzed in a hemispherical detector in which lens voltages direct the electron onto a two-dimensional (energy, momentum) multi-channel plate allowing for angular-resolved photoelectron spectroscopy (ARPES) experiments.

Specification

  • X-ray photoelectron spectroscopy (XPS), angle-resolved XPS, ultraviolet photoelectron spectroscopy (UPS), angle-resolved photoelectron spectroscopy (ARPES).
  • Analysis of the chemical composition (macroscopic area) including bonding environment of the tracked elements. Mapping of the valence band structure.
  • Equipment: Mg/Al X-ray source, He UV source (He I, He II), 2D CCD detector, flood gun, high-precision computer-controlled 5-axis manipulator, sample heating by electron beam heater up to 800 °C (1200 °C for short time), sample cooling by L-N2.

Publications

GLOSS, J.; HORKÝ, M.; KŘIŽÁKOVÁ, V.; FLAJŠMAN, L.; SCHMID, M.; URBÁNEK, M.; VARGA, P., 2019: The growth of metastable fcc Fe78Ni22 thin films on H-Si(100) substrates suitable for focused ion beam direct magnetic patterning. APPLIED SURFACE SCIENCE 469, p. 747 - 6, doi: 10.1016/j.apsusc.2018.10.263 (ICON-SPM, KERR-MICROSCOPE, LYRA, UHV-XPS)

Makoveev, A., 2018: Functional properties of 2D supramolecular nanoarchitectures. TREATISE TO STATE DOCTORAL EXAM, p. 1 - 32 (UHV-LEEM, UHV-XPS, UHV-SPM)

Horký, M., 2016: Growth of Metastable FCC FE Thin Films on Cu(100)/Si(100) Substrates. MASTER'S THESIS, p. 1 - 96 (UHV-XPS, UHV-SPM, ICON-SPM, LYRA, VERIOS, UHV-LEIS, KRATOS-XPS, RIGAKU3)

Details

Guarantor
Polčák, Josef
Site
CEITECNANO
Location
CEITEC Nano - C1.38