Coater Leica EM ACE600

"High vacuum coater for deposition of conductive coatings on SEM and TEM samples. Processes are driven by built-in microprocessor control unit and are fully automatized. Process steps and parameters are set through a touch screen. Equipped with Au sputter target and carbon thread evaporation source as standard. Other targets for sputtering are available by the same device located in building C."

Specification

Process vacuum 5x10−5 mbar @ 15 min
Ultimate vacuum 2x10−6 mbar @ 24 hour
Working distance min. 30 mm, max. 100 mm (z movement motorized)
Specimen table diameter 104 mm
Stage tilt +/- 60° (motorized)
Coating time 1–1800 s (without respect to sample damage)
Coating thickness 1–1000 nm
Coating thickness detection oscillating quartz crystal, readout resolution: one decimal (0.1 nm accuracy)
Process gas for sputtering Argon 99,99 % or better
Venting gas Nitrogen 99,99 %

 

Available materials for deposition

Material Deposition method Deposition source
Carbon (C) evaporation carbon thread
Gold (Au) sputtering target

Gallery

Details

Type of access
Full-service (paid), Self-service
Research area
Synthesis
Category
PVD
Subcategory
Sputtering
Guarantor
Holas, Jiří
Site
CEITECNANO
Location
CEITEC Nano - A1.08