Coater Leica EM ACE600
"High vacuum coater for deposition of conductive coatings on SEM and TEM samples. Processes are driven by built-in microprocessor control unit and are fully automatized. Process steps and parameters are set through a touch screen. Equipped with Au sputter target and carbon thread evaporation source as standard. Other targets for sputtering are available by the same device located in building C."
Specification
| Process vacuum | 5x10−5 mbar @ 15 min |
|---|---|
| Ultimate vacuum | 2x10−6 mbar @ 24 hour |
| Working distance | min. 30 mm, max. 100 mm (z movement motorized) |
| Specimen table | diameter 104 mm |
| Stage tilt | +/- 60° (motorized) |
| Coating time | 1–1800 s (without respect to sample damage) |
| Coating thickness | 1–1000 nm |
| Coating thickness detection | oscillating quartz crystal, readout resolution: one decimal (0.1 nm accuracy) |
| Process gas for sputtering | Argon 99,99 % or better |
| Venting gas | Nitrogen 99,99 % |
Available materials for deposition
| Material | Deposition method | Deposition source |
|---|---|---|
| Carbon (C) | evaporation | carbon thread |
| Gold (Au) | sputtering | target |
Details
Type of access
Full-service (paid),
Self-service
Research area
Synthesis
Category
PVD
Subcategory
Sputtering
Guarantor
Holas, Jiří
Site
CEITECNANO
Location
CEITEC Nano - A1.08