Resist coating and development system SÜSS MicroTec RCD8
Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities
Specification
Methods
semi-automated spin coating and resist developmentGeneral
| Substrate size | 2” to 200 mm round, 2” to 150 mm square |
|---|---|
| Substrate Handling | manual, lift pins |
| User Interface | SUSS MMC Tool Control on Win 7, industrial PC, touch screen |
| Max. # of Recipes | more than 10 000 |
| Max. # of Process Steps | 50 |
Module: Open Bowl Coater
| Spin Speed Max | 10 000 RPM |
|---|---|
| Spin Acceleration | 1 – 7000 RPM/s |
| Bowl Material | Ni-plated Al |
| Dispense arm | 1 resist line, 1 solvent line, motorized syringe pump |
Module: Gyrset Coater
| Spin Speed Max | 3 000 RPM |
|---|---|
| Spin Acceleration | 1 – 3000 RPM/s |
| Bowl Material | Ni-plated Al |
| Cover Options | 3 different sizes in low and high versions |
Module: Puddle developer
| Spin Speed Max | 10 000 RPM |
|---|---|
| Spin Acceleration | 1 – 7000 RPM/s |
| Bowl Material | PE |
| Cover Options | 1 developer line |
Gallery
Publications
KAMNEV, K.; PYTLÍČEK, Z.; BENDOVÁ, M.; PRÁŠEK, J.; GISPERT-GUIRADO, F.; LLOBET, E.; MOZALEV, A., 2023: The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 24 (1), p. 1 - 17, doi: 10.1080/14686996.2022.2162324 (MAGNETRON, SUSS-MA8, SUSS-RCD8, VERIOS, KRATOS-XPS, MPS150)
Hnilica, J., 2023: Current-induced domain wall propagation in ferrimagnetic wires. MASTER'S THESIS (MAGNETRON, VERSALAB, RIGAKU9, SUSS-RCD8, DWL, WIRE-BONDER, KERR-MICROSCOPE)
Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: Silicon Vibrating Micro-Wire Resonators for Study of Quantum Turbulence in Superfluid He-4. JOURNAL OF LOW TEMPERATURE PHYSICS, doi: 10.1007/s10909-022-02675-2 (PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA)
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664 (ALD-FIJI, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
Gaňová, M., 2022: Digital PCR development. PH.D. THESIS, p. 1 - 92 (SUSS-MA8, SUSS-RCD8, PARYLENE-SCS)
Brodský J., 2021: Gas sensors based on 1D and 2D materials. MASTER'S THESIS, p. 1 - 84 (DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, WITEC-RAMAN, ICON-SPM, RIE-FLUORINE, DRIE, LYRA)
Dhankhar, M.;, 2021: Magnetic vortex based memory device. PH.D. THESIS, p. 1 - 100 (KERR-MICROSCOPE, ICON-SPM, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD-FIJI, WIRE-BONDER, SUSS-RCD8)
GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11 (4), p. 365 - 7, doi: 10.3390/mi11040365 (EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38 (6), p. 38 - 6, doi: 10.1116/6.0000558 (SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA)
Fecko, P., 2019: Gecko mimicking surfaces. MASTER'S THESIS, p. 1 - 52 (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD-FIJI, RIE-FLUORINE, ICON-SPM, PARYLENE-SCS, XEF2)
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 4, doi: 10.1109/ISSE.2019.8810156 (ALD-FIJI, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 6, doi: 10.1109/ISSE.2019.8810293 (DRIE, ICON-SPM, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL)