Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3
The Süss MicroTec MA8 is a standard UV lithography tool for exposing wafers through the mask. Exposure can be carried out in proximity mode or in contact mode. The MA8 is equipped with top side optical microscopes and bottom side microscopes, so alignment is possible from both sides of the wafer.
Specification
Mask and Wafer/Substrate
| Wafer Size: | 1” – 200 mm |
|---|---|
| Max. substrate size: | 200 x 200 mm |
| Min. Pieces: | 5 x 5 mm |
| Wafer Thickness: | max. 10 mm |
| Mask Size: | standard 2” x 2” up to 9” x 9” (SEMI) |
Exposure Modes
| Contact: | soft, hard, vacuum |
|---|---|
| Proximity: | exposure gap 1–300 mm |
| Gap setting accuracy: | 1 µm |
| Modes: | constant power, constant dose |
| Options: | Flood exposure |
Exposure Optics
| Resolution: | 1,5 µm (vacuum); 2 µm (hard); 3 µm (soft); 3,5 µm (proximity 20 µm) |
|---|---|
| Wavelength range: | UV400 350–450 nm |
| Exposure source: | Hg lamp 1000 W |
| Intensity uniformity: | less than 3,5 % (200 mm) |
Alignment methods
| Top Side Alignment (TSA): | accuracy less than 0,5 µm (with assisted alignment & SUSS MicroTec recommended wafer targets) |
|---|---|
| Bottom Side Alignment (BSA): | accuracy less than 1 µm |
| TSA Focus Range: | 1–400 µm (AL400 – motorized focus and image capturing) |
Alignment stage
| MA Movement Range: | X: +/- 5mm; Y: +/- 5 mm; Theta +/- 5° |
|---|---|
| Resolution: | 0,1 µm |
Topside Microscope (TSA)
| Movement Range: | X: 33–202 mm; Y: +18, -100 mm; Theta: +/- 5° |
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Bottomside Microscope (BSA)
| Movement Range: | X: 20–210 mm; Y: +/- 22 mm; focus 6 mm |
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Gallery
Publications
TAKHSHA, M.; SINGH, V.; LEDIEU, J.; FABBRICI, S.; CASOLI, F.; MEZZADRI, F.; HORKÝ, M.; FOURNEE, V.; UHLÍŘ, V.; ALBERTINI, F., 2025: Magnetic Manipulation of Spatially Confined Multiferroic Heuslers by Martensitic Microstructure Engineering. SMALL STRUCTURES 6 (11), p. 1 - 12, doi: 10.1002/sstr.202500284 (VERIOS, VERSALAB, SUSS-MA8, RIE-FLUORINE, KERR-MICROSCOPE)
Liu, X.; Brodský, J.; Vírostko, J.; Jarušek, J.; Migliaccio, L.; Zítka, O.; Gablech, I.; Neužil, P., 2025: Affordable method for channel geometry–specific flow control in microfluidics without commercial pumps. SCIENTIFIC REPORTS 15 (1), doi: 10.1038/s41598-025-24442-5 (DRIE, SUSS-MA8, RIE-FLUORINE)
Brodský, J.; Liu, X.; Jarušek, J.; Migliaccio, L.; Neužil, P.; Zítka, O.; Gablech, I., 2025: Determination of ionic concentration in microfluidics using electrical methods. SENSORS AND ACTUATORS A: PHYSICAL 392, p. 1 - 6, doi: 10.1016/j.sna.2025.116719 (SUSS-MA8, RIE-FLUORINE, DRIE)
Horký, M., 2025: Controlling the magnetic phase transition in spatially confined structures. PH.D. THESIS, p. 1 - 181 (RAITH, MIRA-EBL, LYRA, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9)
SUPALOVÁ, L.; BARTOŠÍK, M.; ŠVARC, V.; MACH, J.; PIASTEK, J.; ŠPAČEK, O.; KONEČNÝ, M.; ŠIKOLA, T., 2025: High-Temperature Ultrasensitive FET-Based CVD Graphene Hall Probes. ACS APPLIED ELECTRONIC MATERIALS 7 (13), p. 5889 - 5897, doi: 10.1021/acsaelm.5c00351 (DWL, SUSS-MA8, EVAPORATOR, MIRA-EBL, RIE-FLUORINE, WIRE-BONDER, WITEC-RAMAN, LYRA)
MIGLIACCIO, L.; SAY, M.; PATHAK, G.; GABLECH, I.; BRODSKÝ, J.; DONAHUE, M.; GLOWACKI, E., 2025: Ultrathin Indium Tin Oxide Accumulation Mode Electrolyte-Gated Transistors for Bioelectronics. ADVANCED MATERIALS TECHNOLOGIES, p. 2302219 - 9, doi: 10.1002/admt.202302219 (SUSS-MA8, RIE-FLUORINE, KEITHLEY-4200)
GRYSZEL, M.; JAKEŠOVÁ, M.; VU, X.; INGEBRANDT, S.; GLOWACKI, E., 2024: Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering. ADVANCED HEALTHCARE MATERIALS, doi: 10.1002/adhm.202302400 (EVAPORATOR, DEKTAK, RIE-FLUORINE, DWL, SUSS-MA8)
JAKEŠOVÁ, M.; KUNOVSKÝ, O.; GABLECH, I.; KHODAGHOLY, D.; GELINAS, J.; GLOWACKI, E., 2024: Coupling of photovoltaics with neurostimulation electrodes-optical to electrolytic transduction. JOURNAL OF NEURAL ENGINEERING 21 (4), doi: 10.1088/1741-2552/ad593d (PARYLENE-SCS, MAGNETRON, SUSS-MA8, EVAPORATOR, RIE-FLUORINE, DIENER, WIRE-BONDER)
NOWAKOWSKA, M.; JAKEŠOVÁ, M.; SCHMIDT, T.; OPANČAR, A.; POLZ, M.; REIMER, R.; FUCHS, J.; PATZ, S.; ZIESEL, D.; SCHERUEBEL, S.; KORNMUELLER, K.; RIENMÜLLER, T.; DEREK, V.; GLOWACKI, E.; SCHINDL, R.; ÜÇAL, M., 2024: Light-Controlled Electric Stimulation with Organic Electrolytic Photocapacitors Achieves Complex Neuronal Network Activation: Semi-Chronic Study in Cortical Cell Culture and Rat Model. ADVANCED HEALTHCARE MATERIALS 13 (29), p. 1 - 19, doi: 10.1002/adhm.202401303 (DWL, SUSS-MA8)
BRODSKÝ, J.; GABLECH, I.; MIGLIACCIO, L.; HAVLÍČEK, M.; DONAHUE, M.; GLOWACKI, E., 2023: Downsizing the Channel Length of Vertical Organic Electrochemical Transistors. ACS APPL MATER INTER 15 (22), p. 27002 - 8, doi: 10.1021/acsami.3c02049 (SUSS-MA8, EVAPORATOR, SCIA, PARYLENE-SCS, RIE-FLUORINE, MIRA-EBL, DEKTAK, ICON-SPM)
KAMNEV, K.; PYTLÍČEK, Z.; BENDOVÁ, M.; PRÁŠEK, J.; GISPERT-GUIRADO, F.; LLOBET, E.; MOZALEV, A., 2023: The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 24 (1), p. 1 - 17, doi: 10.1080/14686996.2022.2162324 (MAGNETRON, SUSS-MA8, SUSS-RCD8, VERIOS, KRATOS-XPS, MPS150)
CHMELÍKOVÁ, L.; FECKO, P.; CHMELÍK, J.; SKÁCEL, J.; OTÁHAL, A.; FOHLEROVÁ, Z., 2023: Demolded hollow high aspect-ratio parylene-C micropillars for real-time mechanosensing applications. APPLIED MATERIALS TODAY, p. 1 - 12, doi: 10.1016/j.apmt.2023.101736 (DRIE, PARYLENE-SCS, SUSS-MA8, XEF2)
GABLECH, I.; BRODSKÝ, J.; VYROUBAL, P.; PIASTEK, J.; BARTOŠÍK, M.; PEKÁREK, J., 2022: Mechanical strain and electric-field modulation of graphene transistors integrated on MEMS cantilevers. JOURNAL OF MATERIALS SCIENCE 57 (3), p. 1923 - 13, doi: 10.1007/s10853-021-06846-6 (RIE-FLUORINE, DRIE, EVAPORATOR, WIRE-BONDER, WITEC-RAMAN, MPS150, KEITHLEY-4200, SUSS-MA8, DWL)
Gaňová, M., 2022: Digital PCR development. PH.D. THESIS, p. 1 - 92 (SUSS-MA8, SUSS-RCD8, PARYLENE-SCS)
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664 (ALD-FIJI, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: Silicon Vibrating Micro-Wire Resonators for Study of Quantum Turbulence in Superfluid He-4. JOURNAL OF LOW TEMPERATURE PHYSICS, doi: 10.1007/s10909-022-02675-2 (PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA)
ABUDLLAEVA, O.; SAHALIANOV, I.; EJNEBY, M.; JAKEŠOVÁ, M.; ZOZOULENKO, I.; LIIN, S.; GLOWACKI, E., 2022: Faradaic Pixels for Precise Hydrogen Peroxide Delivery to Control M-Type Voltage-Gated Potassium Channels. ADVANCED SCIENCE, p. 1 - 14, doi: 10.1002/advs.202103132 (DIENER, EVAPORATOR, SUSS-MA8, PARYLENE-SCS, RIE-FLUORINE)
Brodský J., 2021: Gas sensors based on 1D and 2D materials. MASTER'S THESIS, p. 1 - 84 (DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, WITEC-RAMAN, ICON-SPM, RIE-FLUORINE, DRIE, LYRA)
GHAHFAROKHI, M.; ARREGI URIBEETXEBARRIA, J.; CASOLI, F.; HORKÝ, M.; CABASSI, R.; UHLÍŘ, V.; ALBERTINI, F., 2021: Microfabricated ferromagnetic-shape-memory Heuslers: The geometry and size effects. APPLIED MATERIALS TODAY 23, p. 101058-1 - 11, doi: 10.1016/j.apmt.2021.101058 (VERSALAB, RIGAKU9, KERR-MICROSCOPE, SUSS-MA8, RIE-FLUORINE, EVAPORATOR, WIRE-BONDER, VERIOS)
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38 (6), p. 38 - 6, doi: 10.1116/6.0000558 (SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE-SCS, XEF2, APCVD, LYRA)
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11 (4), p. 365 - 7, doi: 10.3390/mi11040365 (EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)
GABLECH, I.; KLEMPA, J.; PEKÁREK, J.; VYROUBAL, P.; KUNZ, J.; NEUŽIL, P., 2019: Aluminum nitride based piezoelectric harvesters. 2019 19TH INTERNATIONAL CONFERENCE ON MICRO AND NANOTECHNOLOGY FOR POWER GENERATION AND ENERGY CONVERSION APPLICATIONS (POWERMEMS) (001), p. 1 - 4, doi: 10.1109/PowerMEMS49317.2019.82063211368 (DIENER, DRIE, DWL, KAUFMAN, RIE-CHLORINE, SUSS-MA8)
Vida, J., 2019: Deposition of ternary oxides with titanium and characterization of their optical and electrical properties. MASTER'S THESIS, p. 1 - 50 (KRATOS-XPS, ALD-FIJI, WOOLLAM-VIS, VUVAS, RIGAKU3, EVAPORATOR, SUSS-MA8, SUMMIT)
PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 6, doi: 10.1109/ISSE.2019.8810293 (DRIE, ICON-SPM, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL)
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 4, doi: 10.1109/ISSE.2019.8810156 (ALD-FIJI, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
Fecko, P., 2019: Gecko mimicking surfaces. MASTER'S THESIS, p. 1 - 52 (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD-FIJI, RIE-FLUORINE, ICON-SPM, PARYLENE-SCS, XEF2)
Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR'S THESIS, p. 1 - 50 (MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
PODEŠVA, P.; GABLECH, I.; NEUŽIL, P., 2018: Nanostructured Gold Microelectrode Array for Ultrasensitive Detection of Heavy Metal Contamination. ANALYTICAL CHEMISTRY 90 (2), p. 1161 - 7, doi: 10.1021/acs.analchem.7b0372 (SUSS-MA8, DWL, SCIA, DIENER)
GABLECH, I.; SOMER, J.; FOHLEROVÁ, Z.; SVATOŠ, V.; PEKÁREK, J.; KURDÍK, S.; FENG, J.; FECKO, P.; PODEŠVA, P.; HUBÁLEK, J.; NEUŽIL, P., 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22 (9), p. NA - 7, doi: 10.1007/s10404-018-2125-6 (DRIE, DWL, SUSS-MA8, PARYLENE-SCS, XEF2)
Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER'S THESIS, p. 1 - 68 (DWL, ALD-FIJI, MAGNETRON, EVAPORATOR, RIE-FLUORINE, RIE-CHLORINE, SUSS-MA8, DEKTAK, MPS150)
Pekárek, J.; Prokop, R.; Svatoš, V.; Gablech, I.; Hubálek, J.; Neužil, P., 2017: Self-compensating method for bolometer–based IR focal plane arrays. SENSORS AND ACTUATORS, A: PHYSICAL 265, p. 40 - 46, doi: 10.1016/j.sna.2017.08.025 (SUSS-MA8, EVAPORATOR, RIE-FLUORINE, SUMMIT, SCIA)