Spectroscopic reflectometer Ocean Optics NanoCalc 2000

Multilayers characterization, resist thickness measurement mainly. Interval of measure film thickness from 10 nm up to 100 um.

Specification

Methods

Resist thickness measurement mainly. Film thickness from 10 nm up to 100 µm.

Gallery

Publications

Horký, M., 2025: Controlling the magnetic phase transition in spatially confined structures. PH.D. THESIS, p. 1 - 181 (RAITH, MIRA-EBL, LYRA, SUSS-MA8, DEKTAK, NANOCALC, MAGNETRON, EVAPORATOR, RIE-FLUORINE, WIRE-BONDER, MPS150, CRYOGENIC, LAKESHORE, VERSALAB, ICON-SPM, TITAN, HELIOS, VERIOS, RIGAKU3, RIGAKU9)

Koňařík, L., 2024: Development and fabrication of microelectromechanical systems MEMS. BACHELOR'S THESIS, p. 1 - 46 (LASER-DICER, DWL, EVAPORATOR, RIE-FLUORINE, DRIE, NANOCALC, DEKTAK, WIRE-BONDER, LYRA)

GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: Strong coupling in an Au plasmonic antenna-SiO2 layer system: A hybrid-mode analysis. PHYSICAL REVIEW B 107 (12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144 (ALD-FIJI, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, ICON-SPM, WOOLLAM-MIR)

Idesová, B., 2023: Design and fabrication of dielectric metasurfaces for ultraviolet wavelengths. MASTER'S THESIS, p. 1 - 71 (EVAPORATOR, ALD-FIJI, RAITH, NANOCALC, SCIA)

Jarušek, J., 2022: Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications. BACHELOR'S THESIS, p. 1 - 75 (DEKTAK, KAUFMAN, RIE-CHLORINE, NANOCALC, RIGAKU9, KEITHLEY-4200)

Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)

Fabianová, K., 2016: Fabrication of well defined nanoporous structures with application in membrane sensing. BACHELOR’S THESIS, p. 1 - 54 (PECVD, MIRA-EBL, LYRA, RIE-FLUORINE, NANOCALC, MAGNETRON, EVAPORATOR)

Details

Type of access
Full-service (paid), Self-service
Research area
Devices
Category
Lithography
Subcategory
Inspection
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.30

Documents

List of Experienced Users in Photolihography Lab C1.30
NANOCALC Quick Guide
External Manuals & Docs