Spectroscopic reflectometer Ocean Optics NanoCalc 2000
Multilayers characterization, resist thickness measurement mainly. Interval of measure film thickness from 10 nm up to 100 um.
Specification
Methods
Resist thickness measurement mainly. Film thickness from 10 nm up to 100 µm.Gallery
Publications
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)
Fabianová, K., 2016: Fabrication of well defined nanoporous structures with application in membrane sensing. BACHELOR’S THESIS, p. 1 - 54 (PECVD, MIRA-EBL, LYRA, RIE-FLUORINE, NANOCALC, MAGNETRON, EVAPORATOR)
Details
Type of access
Full-service (paid),
Self-service
Research area
Devices
Category
Lithography
Subcategory
Inspection
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.30