Spectroscopic reflectometer Ocean Optics NanoCalc 2000

Multilayers characterization, resist thickness measurement mainly. Interval of measure film thickness from 10 nm up to 100 um.

Publications

GALLINA, P.; KVAPIL, M.; LIŠKA, J.; KONEČNÁ, A.; KŘÁPEK, V.; KALOUSEK, R.; ZLÁMAL, J.; ŠIKOLA, T., 2023: Strong coupling in an Au plasmonic antenna-SiO2 layer system: A hybrid-mode analysis. PHYSICAL REVIEW B 107 (12), p. 125144 - 6, doi: 10.1103/PhysRevB.107.125144 (ALD, EVAPORATOR, MIRA-EBL, FTIR, NANOCALC, DEKTAK, ICON-SPM, WOOLLAM-MIR)

Idesová, B., 2023: Design and fabrication of dielectric metasurfaces for ultraviolet wavelengths. MASTER'S THESIS, p. 1 - 71 (EVAPORATOR, ALD, RAITH, NANOCALC, SCIA)

Jarušek, J., 2022: Sputtering of nitride layers using Kaufman ion-beam source for bioelectronics applications. BACHELOR'S THESIS, p. 1 - 75 (DEKTAK, KAUFMAN, RIE-CHLORINE, NANOCALC, RIGAKU9, KEITHLEY-4200)

Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, ICON-SPM, NANOCALC, MPS150, WIRE-BONDER)

Fabianová, K., 2016: Fabrication of well defined nanoporous structures with application in membrane sensing. BACHELOR’S THESIS, p. 1 - 54 (PECVD, MIRA-EBL, LYRA, RIE-FLUORINE, NANOCALC, MAGNETRON, EVAPORATOR)

Gallery

Specification

Methods

Resist thickness measurement mainly. Film thickness from 10 nm up to 100 µm.

Details

Type of access
Full-service (paid), Self-service
Research area
Devices
Category
Lithography
Subcategory
Inspection
Guarantor
Švarc, Vojtěch
Site
CEITECNANO
Location
CEITEC Nano - C1.30

Documents

List of Experienced Users in Photolihography Lab C1.30
NANOCALC Quick Guide
External Manuals & Docs