UV Direct Write Laser system Heidelberg Instruments DWL 66-fs
Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities
Specification
Methods
sub 2-micrometer laser scanning lithography, maskmakingDWL 66FS key features
| Substrates | from 30mm x 30 mm up to 200 mm x 200 mm |
|---|---|
| Structures resolution | down to 1 µm |
| Address grid | down to 100 nm |
| Exposure mode | Raster |
| Special – Grayscale | |
| Layout alignment | Topside Camera system |
| Backside Camera - only for >100mm substrates | |
| Chamber | Climate |
| Autofocus | Air-gauge |
| Scripting capability | |
| Data inputs format2 | DXF, CIF, GDSII, Gerber, BMP, Ascii, STL |
Advanced
| Write lens | mode 2 | 4 mm |
|---|---|---|
| Pixel width | 200 nm | |
| Address Grid | 100 nm | |
| Minimum Structure Size | 1 µm | |
| Write speed | 10 mm2/min | |
| Edge Roughness [3sigma] | 80 nm | |
| CD Uniformity [3sigma] | 100 nm | |
| Alignment Accuracy [3sigma] | TSA | 250 nm |
| BSA | 1000 nm |
Gallery
Publications
GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11 (4), p. 365 - 7, doi: 10.3390/mi11040365 (EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS, p. 1 - 199 (ALD-FIJI, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON)
Brodský, J., 2019: Characterization of graphene elecrical properties on MEMS structures. BACHELOR'S THESIS, p. 1 - 50 (MPS150, WITEC-RAMAN, EVAPORATOR, DRIE, PECVD, DWL, SUSS-MA8, RIE-FLUORINE, RIE-CHLORINE, DIENER, SCIA)
Fecko, P., 2019: Gecko mimicking surfaces. MASTER'S THESIS, p. 1 - 52 (SUSS-RCD8, SUSS-MA8, DWL, DRIE, LYRA, ALD-FIJI, RIE-FLUORINE, ICON-SPM, PARYLENE-SCS, XEF2)
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 4, doi: 10.1109/ISSE.2019.8810156 (ALD-FIJI, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)
PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE, p. 1 - 6, doi: 10.1109/ISSE.2019.8810293 (DRIE, ICON-SPM, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL)
CHMELA, O.; SADÍLEK, J.; SAMA, DOMENECH-GIL, G.; J.; SOMER, J.; MOHAN, R.; ROMANO-RODRIGUEZ, A.; HUBÁLEK, J.; VALLEJOS VARGAS, S., 2018: Selectively arranged single-wire based nanosensor array systems for gas monitoring. NANOSCALE 10 (19), p. 9087 - 10, doi: 10.1039/c8nr01588k (RAITH, DWL, KAUFMAN, MAGNETRON, SCIA, RIE-FLUORINE, WIRE-BONDER, RIGAKU3)
STARÁ, V.; PROCHÁZKA, P.; MAREČEK, D.; ŠIKOLA, T.; ČECHAL, J., 2018: Ambipolar remote graphene doping by low-energy electron beam irradiation. NANOSCALE 10 (37), p. 17520 - 5, doi: 10.1039/c8nr06483k (ALD-FIJI, DIENER, DWL, EVAPORATOR)
GABLECH, I.; SOMER, J.; FOHLEROVÁ, Z.; SVATOŠ, V.; PEKÁREK, J.; KURDÍK, S.; FENG, J.; FECKO, P.; PODEŠVA, P.; HUBÁLEK, J.; NEUŽIL, P., 2018: Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating. MICROFLUIDICS AND NANOFLUIDICS 22 (9), p. NA - 7, doi: 10.1007/s10404-018-2125-6 (DRIE, DWL, SUSS-MA8, PARYLENE-SCS, XEF2)
Vančík, S., 2018: MEMS microhotplate platform for chemical sensors. MASTER'S THESIS, p. 1 - 68 (DWL, ALD-FIJI, MAGNETRON, EVAPORATOR, RIE-FLUORINE, RIE-CHLORINE, SUSS-MA8, DEKTAK, MPS150)